{"id":14,"count":8,"description":"This is a film deposition system that utilizes the sputtering phenomenon in which Ar ions collide with the target under plasma discharge, and the target material ejected by the collision are deposited on the substrate as a film.\r\nAs a related matter, we also introduce Annealing equipment to enhance the quality of the film after the deposition process.","link":"https:\/\/agus.co.jp\/en\/?cat=14","name":"Sputtering Equipment","slug":"pcat1-1-1","taxonomy":"category","parent":8,"meta":[],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.2 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Sputtering Equipment | SUGA Co., Ltd.<\/title>\n<meta name=\"description\" content=\"This is a film deposition system that utilizes the sputtering phenomenon in which Ar ions collide with the target under plasma discharge, and the target material ejected by the collision are deposited on the substrate as a film. 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