{"id":3105,"date":"2022-12-13T16:36:00","date_gmt":"2022-12-13T07:36:00","guid":{"rendered":"https:\/\/agus.co.jp\/en\/?p=3105"},"modified":"2023-04-28T12:06:57","modified_gmt":"2023-04-28T03:06:57","slug":"ald-system-with-high-deposition-performance-5-choices-applications-and-features-are-also-explained","status":"publish","type":"post","link":"https:\/\/agus.co.jp\/en\/?p=3105","title":{"rendered":"ALD system with high deposition performance: 5 choices! Applications and features are also explained"},"content":{"rendered":"\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"301\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_1.png\" alt=\"ALD system with high deposition performance: 5 choices! Applications and features are also explained \" class=\"wp-image-3329\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_1.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_1-300x282.png 300w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>SUGA, located in Hokuto City near Hakodate city, Hokkaido, was founded in 1946 as a repair company for fishery equipment. Addition to the repair work, we have been manufacturing vacuum equipment and devices with the aim of further developing and improving its products.<\/p>\n\n\n\n<p>In this issue, we would like to introduce ALD system of SUGA.<\/p>\n\n\n\n<p>Our ALD system is a compact atomic layer deposition system for research and development that provides uniform control of each atomic layer and enables deposition of high quality films with high step coverage.<\/p>\n\n\n\n<p>Please refer to the following section for a summary of features and applications.<\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">1 SAL1000 (desktop ALD system) can easily produce thin films one atomic layer each.<\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"301\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_2.png\" alt=\"1 SAL1000 (desktop ALD system) can easily produce thin films one atomic layer each.\" class=\"wp-image-3330\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_2.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_2-300x282.png 300w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>The ALD (ALD = Atomic Layer Deposition) system can realize precise deposition control for each atomic layer and the formation of thin films that are uniform and have excellent step coverage even on uneven surfaces.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"827\" height=\"379\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_3.jpg\" alt=\"1 SAL1000 (desktop ALD system) can easily produce thin films one atomic layer each.\" class=\"wp-image-3331\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_3.jpg 827w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_3-300x137.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_3-768x352.jpg 768w\" sizes=\"auto, (max-width: 827px) 100vw, 827px\" \/><\/figure>\n\n\n\n<p>Characteristics.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>It allows uniform, pinhole-free deposition on the substrate surface with one atomic layer each.<\/li><li>Simple and straightforward hardware operation. Buttons for disposal operations and a valve for adjusting the gas outflow are also located on the front panel.<\/li><li>The touch panel software has designed a screen layout that facilitates recognition of the conditions during deposition.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p>Application.<\/p>\n\n\n\n<p>ALD (Atomic Layer Deposition) system for research and development.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=272\">Learn more about SAL1000.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">2 SAL1000B (ALD system for powder deposition) for all-round deposition on powder.<\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_4.png\" alt=\"\" class=\"wp-image-3332\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_4.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_4-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>Oxide films (AL2O3, HfO2, SiO2, TiO2) can be obtained by surface chemical reaction with water or ozone using raw materials in precursor bottles, called precursors, as deposition materials.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"827\" height=\"379\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_5.jpg\" alt=\"2 SAL1000B (ALD system for powder deposition) for all-round deposition on powder.\" class=\"wp-image-3333\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_5.jpg 827w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_5-300x137.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_5-768x352.jpg 768w\" sizes=\"auto, (max-width: 827px) 100vw, 827px\" \/><\/figure>\n\n\n\n<p>Characteristics.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>Due to its excellent step coverage, it is suitable for deposition on uneven surface profiles and three-dimensional shapes.<\/li><li>The touch panel software has designed a screen layout that facilitates recognition of the conditions during deposition.<\/li><li>For efficient powder deposition, the tilting frame can be adjusted so that it is tilted forward by up to 45\u00b0.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p>Application.<\/p>\n\n\n\n<p>Table-top type system for research and development. The ability to deposit an all-round film on powder allows it to be used in fields involving powder and granular materials, for example, in the development of new materials.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=287\">Learn more about SAL1000B.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">3 SAL1000G (ALD system with glove box)<\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"367\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_6.png\" alt=\"3 SAL1000G (ALD system with glove box)\" class=\"wp-image-3334\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_6.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_6-262x300.png 262w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>This model is a table-top type ALD system equipped with a glove box to meet deposition needs with anaerobic materials that react with oxidation and the atmosphere.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"421\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_7-1024x421.jpg\" alt=\"3 SAL1000G (ALD system with glove box)\" class=\"wp-image-3335\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_7-1024x421.jpg 1024w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_7-300x123.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_7-768x316.jpg 768w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_7-1536x632.jpg 1536w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_7.jpg 1903w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<p>Characteristics.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>Table-top type ALD system with acrylic glovebox for vacuum evacuation and nitrogen venting.<\/li><li>Deposition is possible on wafer geometries up to 4 inch. It is also equipped with a MAX 350\u00b0C heating mechanism. In tests with AL2O3, it has a film thickness distribution performance of less than 3% within \u03a6100 mm.<\/li><li>A large handle is attached at the main unit as a portable tabletop system.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p>Application.<\/p>\n\n\n\n<p>Table-top ALD (atomic layer deposition) system for research and development.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=305\">Learn more about SAL1000G.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">4 Compact, full-featured SAL3000 (ALD system)<\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_8.png\" alt=\" 4 Compact, full-featured SAL3000 (ALD system)\" class=\"wp-image-3336\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_8.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_8-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>In addition to the conventional depot-down type specification, a &#8216;depot-up&#8217; type is available to further reduce particle adhesion to the substrate.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"600\" height=\"450\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_9.png\" alt=\" 4 Compact, full-featured SAL3000 (ALD system)\" class=\"wp-image-3337\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_9.png 600w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_9-300x225.png 300w\" sizes=\"auto, (max-width: 600px) 100vw, 600px\" \/><\/figure>\n\n\n\n<p>Characteristics.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>For substrate sizes up to \u03c6100 mm, the performance of \u00b13% film thickness distribution, uniform, pinhole-free layered deposition is possible.<\/li><li>You can choose between depot-down (substrate face-up) SAL3000D and depot-up (substrate face-down) SAL3000U specifications.<\/li><li>The touch panel is positioned at an elevated angle and it has excellent visibility and operability.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p>Application.<\/p>\n\n\n\n<p>ALD (Atomic Layer Deposition) system for research and development.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=255\">Learn more about SAL3000.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">5 SAL3000Plus (extendable ALD system) for a wide range of experiments with its compact size and combination with other equipment.<\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_10.png\" alt=\"5 SAL3000Plus (extendable ALD system) for a wide range of experiments with its compact size and combination with other equipment.\" class=\"wp-image-3338\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_10.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-deposition_10-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>The ALD (ALD = Atomic Layer Deposition) system realizes precise deposition control for each atomic layer and the formation of thin films that are uniform and have excellent step coverage even on uneven surfaces.<\/p>\n\n\n\n<p>Characteristics.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>High-quality deposition distribution with excellent step coverage, making it suitable for deposition on uneven surface geometries and three-dimensional shapes.<\/li><li>You can choose between the SAL3000+D depot-down (substrate face-up) or SAL3000+U depot-up (substrate face-down) versions of the SAL3000Plus.<\/li><li>A port for expansion is provided on the side of the unit, which can be connected to the transfer unit STR2000 to obtain a load lock function.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p>Application.<\/p>\n\n\n\n<p>Oxide films (AL2O3, HfO2, SiO2, TiO2) can be obtained by surface chemical reaction with water or ozone using raw materials in precursor bottles, called precursors, as deposition materials.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=236\">Learn more about SAL3000Plus.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">Summary.<\/h2>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\">SUGA<\/a> manufactures vacuum equipment, including the <a href=\"https:\/\/agus.co.jp\/en\/?cat=4\">ALD equipment<\/a> described here, as well as <a href=\"https:\/\/agus.co.jp\/en\/?cat=4\">annealing equipment<\/a> for improving film quality after deposition.<\/p>\n\n\n\n<p>We also offer support for <a href=\"https:\/\/agus.co.jp\/en\/?cat=7\">servicing<\/a>, repairs and modifications, please <a href=\"https:\/\/agus.co.jp\/en\/?page_id=95\">contact us<\/a> for more information.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>SUGA, located in Hokuto City near Hakodate city, Hokkaido, was founded in 1[\u3082\u3063\u3068\u8aad\u307e\u305b\u3066\u301c]<\/p>\n","protected":false},"author":1,"featured_media":3110,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[51],"tags":[],"class_list":["post-3105","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-ald"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>ALD system with high deposition performance: 5 choices! 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