{"id":3134,"date":"2022-12-16T09:17:00","date_gmt":"2022-12-16T00:17:00","guid":{"rendered":"https:\/\/agus.co.jp\/en\/?p=3134"},"modified":"2023-04-28T11:14:00","modified_gmt":"2023-04-28T02:14:00","slug":"what-sputtering-equipment-is-capable-of-high-film-quality-explanation-of-the-characteristics-of-five-types-of-equipment-for-different-applications","status":"publish","type":"post","link":"https:\/\/agus.co.jp\/en\/?p=3134","title":{"rendered":"What sputtering equipment is capable of high film quality? Explanation of the characteristics of five types of equipment for different applications."},"content":{"rendered":"\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_1.png\" alt=\"What sputtering equipment is capable of high film quality? Explanation of the characteristics of five types of equipment for different applications.\" class=\"wp-image-3308\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_1.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_1-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>Sputtering system employs the sputtering phenomenon.<\/p>\n\n\n\n<p>Ar ions are bombarded onto the target under a plasma discharge and the target material tapped out by them is deposited by the sputtering phenomenon.<\/p>\n\n\n\n<p>It is used in research and development applications such as metal films, insulating films, conductive films, protective films, reflective films, catalysts, coatings, circuits, batteries, MEMS and advanced materials.<\/p>\n\n\n\n<p>Founded in 1946 as a repairer company for fishing boats, SUGA manufactures and sells vacuum equipment and is now expanding its activities mainly to R&amp;D equipment for universities and research institutions.<\/p>\n\n\n\n<p>In this article, we will introduce the sputtering system manufactured by SUGA, which we hope you will find useful.<\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">Active in research and development, including the development of metal films and new materials!<br>\u3010SSP1000\u30fbSSP2000Plus\u30fbSSP2500G\u30fbSSP3000\u30fbSSP3000Plus\u3011<\/h2>\n\n\n\n<h3 class=\"wp-block-heading\">SSP1000\u3008Cubic Sputtering Equipment\u3009<\/h3>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_2.png\" alt=\"SSP1000\u3008Cubic Sputtering Equipment\u3009\" class=\"wp-image-3309\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_2.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_2-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>Characteristics<\/p>\n\n\n\n<p>Equipped with one 2-inch diameter magnetron cathode (with shutter), the performance is less than \u00b15% film thickness distribution within \u03c6100 mm.<\/p>\n\n\n\n<p>This entry-level model does not compromise but employs the same cathode structure as the superior model.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"420\" height=\"361\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_3.png\" alt=\"SSP1000\u3008Cubic Sputtering Equipment\u3009\" class=\"wp-image-3310\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_3.png 420w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_3-300x258.png 300w\" sizes=\"auto, (max-width: 420px) 100vw, 420px\" \/><\/figure>\n\n\n\n<ul class=\"wp-block-list\"><li>The dice-shaped chamber (deposition chamber) can change the deposition direction into three different way.<\/li><li>The high-frequency RF power supply with pulse oscillation function enables stable deposition even on targets made of insulating materials, which are prone to abnormal discharges.<\/li><li>The automatic vacuum pumping system reduces the risk of accidental damage to the equipment during operations involving the exhaust system, making the equipment safe to use.<\/li><li>Various instruments and operating system components are efficiently arranged.<\/li><li>Interlocks are set up so that the plasma discharge is not powered on unless a number of conditions are met, such as the proper operation signal of the exhaust system pump, pressure information from the vacuum gauge and cooling water sensor signal.<\/li><li>Both stacked and parallel (horizontal) arrangements are possible to accommodate a variety of installation environments.<\/li><li>Users who regularly handle vacuum equipment (especially sputtering equipment) can set up and start up the equipment by themselves, as it is not difficult to do so.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=218\">For more information.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">SSP2000Plus\u3008Sputtering Equipment (Expandable type)\u3009<\/h3>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1000\" height=\"1000\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_4.jpg\" alt=\"SSP2000Plus\u3008Sputtering Equipment (Expandable type)\u3009\" class=\"wp-image-3311\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_4.jpg 1000w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_4-300x300.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_4-150x150.jpg 150w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_4-768x768.jpg 768w\" sizes=\"auto, (max-width: 1000px) 100vw, 1000px\" \/><\/figure>\n\n\n\n<p>Equipped with two 2-inch diameter magnetron cathodes (with shutters), with a film thickness distribution of \u00b15% or less within \u03c6100 mm.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"246\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_5.jpg\" alt=\"SSP2000Plus\u3008Sputtering Equipment (Expandable type)\u3009\" class=\"wp-image-3312\"\/><\/figure>\n\n\n\n<ul class=\"wp-block-list\"><li>For the function of substrate heating, which determines film quality, a heater with a standard specification of MAX 300\u00b0C is installed, enabling high quality film deposition.<\/li><li>The high-frequency RF power supply with pulse oscillation function enables stable deposition even on targets made of insulating materials, which are prone to abnormal discharges.<\/li><li>The system can be combined with Plus series sputtering, ALD, annealing and deposition equipment, enabling a variety of deposition processes without exposing the substrate to the atmosphere.<\/li><li>It combines visibility regarding various statuses, including operating status, with easy operation for adjusting valves and setting items.<\/li><li>The slim tower shape makes it easy to move and reduce man-hours (=expenditure) when relocating or changing the room layout after installation.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=204\">For more information.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">SSP2500G\u3008Sputtering Equipment with Glove Box\u3009<\/h3>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_6.png\" alt=\"SSP2500G\u3008Sputtering Equipment with Glove Box\u3009\" class=\"wp-image-3313\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_6.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_6-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>By switching the discharging cathode, this equipment can also be used for layered deposition.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"205\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_7.png\" alt=\"SSP2500G\u3008Sputtering Equipment with Glove Box\u3009\" class=\"wp-image-3314\"\/><\/figure>\n\n\n\n<ul class=\"wp-block-list\"><li>Equipped with a simple glove box (made of acrylic resin) that can be vacuum-replaced, allowing substrate replacement and target removal and attachment without exposure to atmospheric moisture or oxygen.<\/li><li>The 13.56MHz 200W RF power supply made in Japan is equipped with an auto-matching function as standard so that fine adjustments are made automatically during plasma discharge.<\/li><li>It combines visibility regarding various statuses, including operating status, and operability for easy adjustment of valves and setting items.<\/li><li>No exposed wiring on the back of the unit for a clean appearance. It\u2019s easy to move and reduce man-hours (=expenditure) when relocating or changing the room layout after installation.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=188\">For more information.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">SSP3000\u3008Sputtering Equipment\u3009<\/h3>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_8.png\" alt=\"SSP3000\u3008Sputtering Equipment\u3009\" class=\"wp-image-3315\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_8.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_8-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>Equipped with three 2-inch diameter magnetron cathodes (with shutters), it achieves high-quality film deposition with a film thickness distribution of \u00b13% or less within a \u03c6100 mm area, which is the highest quality in Japan (according to our survey).<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"913\" height=\"1024\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_9-913x1024.jpg\" alt=\"SSP3000\u3008Sputtering Equipment\u3009\" class=\"wp-image-3316\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_9-913x1024.jpg 913w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_9-267x300.jpg 267w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_9-768x861.jpg 768w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_9.jpg 1119w\" sizes=\"auto, (max-width: 913px) 100vw, 913px\" \/><\/figure>\n\n\n\n<ul class=\"wp-block-list\"><li>The substrate heating function, which determines film quality, can be optionally heated by a radiation heater to MAX 800 \u00b0C (monitor temperature), compared to the standard specification of MAX 300 \u00b0C.<\/li><li>The high-frequency RF power supply with pulse oscillation function enables stable deposition even on targets made of insulating materials, which are prone to abnormal discharges.<\/li><li>It is designed to allow an optional automatic load lock chamber to be installed within the enclosure with the width dimension D=1418 mm of the main unit remaining unchanged.<\/li><li>The touch panel is positioned at an elevated angle and designed for better visibility and easy operation.<\/li><li>No exposed wiring on the back of the unit for a clean appearance. It\u2019s easy to move and reduce man-hours (=expenditure) when relocating or changing the room layout after installation.<\/li><li>Various options can be added depending on required performance and membrane quality.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=163\">For more information.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">SSP3000Plus\u3008Sputtering Equipment (Expandable type)\u3009<\/h3>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_10.png\" alt=\"SSP3000Plus\u3008Sputtering Equipment (Expandable type)\u3009\" class=\"wp-image-3317\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_10.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_10-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p>As the same as SSP3000, high-quality deposition is achieved. In addition to this, it is also capable of single-layer, multilayer and alloy deposition.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"554\" height=\"612\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_11.png\" alt=\"SSP3000Plus\u3008Sputtering Equipment (Expandable type)\u3009\" class=\"wp-image-3318\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_11.png 554w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2023\/04\/high-quality_11-272x300.png 272w\" sizes=\"auto, (max-width: 554px) 100vw, 554px\" \/><\/figure>\n\n\n\n<ul class=\"wp-block-list\"><li>The substrate heating function, which determines film quality, can be optionally heated by a radiation heater to MAX 800 \u00b0C (monitor temperature), compared to the standard specification of MAX 300 \u00b0C.<\/li><li>The high-frequency RF power supply with pulse oscillation function enables stable deposition even on targets made of insulating materials, which are prone to abnormal discharges.<\/li><li>A port for expansion is provided on the side of the unit, which can be connected to the transfer unit STR2000 to provide a load lock function cabinet.<\/li><li>Designed with visibility and operability in mind, it combines visibility regarding various statuses, including operating status, with easy operation for adjusting valves and setting items.<\/li><li>No exposed wiring on the back of the unit for a clean appearance. It\u2019s easy to move and reduce man-hours (=expenditure) when relocating or changing the room layout after installation.<\/li><li>As well as a wide range of options, the structure allows easy connection to ALD and annealing equipment via the transfer unit STR2000, even after the installation.<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?p=60\">For more information.<\/a><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">Summary<\/h2>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\">SUGA<\/a> which manufactures vacuum equipment, uses <a href=\"https:\/\/agus.co.jp\/en\/?cat=4\">annealing equipment<\/a> for film quality improvement applications after film deposition as vacuum equipment, and provides <a href=\"https:\/\/agus.co.jp\/en\/?cat=24\">vacuum and piping components<\/a> required for the configuration of vacuum equipment and vacuum facilities.<\/p>\n\n\n\n<p>We also offer support for <a href=\"https:\/\/agus.co.jp\/en\/?cat=7\">service<\/a>, repairs and modifications, please <a href=\"https:\/\/agus.co.jp\/en\/?page_id=95\">contact us<\/a> for more information.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Sputtering system employs the sputtering phenomenon. Ar ions are bombarded [\u3082\u3063\u3068\u8aad\u307e\u305b\u3066\u301c]<\/p>\n","protected":false},"author":1,"featured_media":3136,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[50],"tags":[],"class_list":["post-3134","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-sputtering"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>What sputtering equipment is capable of high film quality? Explanation of the characteristics of five types of equipment for different applications. | SUGA Co., Ltd.<\/title>\n<meta name=\"description\" content=\"Sputtering system employs the sputtering phenomenon. 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