{"id":3762,"date":"2024-01-10T07:47:00","date_gmt":"2024-01-09T22:47:00","guid":{"rendered":"https:\/\/agus.co.jp\/en\/?p=3762"},"modified":"2024-04-17T10:48:41","modified_gmt":"2024-04-17T01:48:41","slug":"explanation-of-the-principles-of-cvd-chemical-vapor-deposition","status":"publish","type":"post","link":"https:\/\/agus.co.jp\/en\/?p=3762","title":{"rendered":"Explanation of the principles of CVD (chemical vapor deposition)."},"content":{"rendered":"\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"630\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Explanation-of-the-principles-of-CVD-chemical-vapor-deposition.--1024x630.jpg\" alt=\"\" class=\"wp-image-3766\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Explanation-of-the-principles-of-CVD-chemical-vapor-deposition.--1024x630.jpg 1024w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Explanation-of-the-principles-of-CVD-chemical-vapor-deposition.--300x185.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Explanation-of-the-principles-of-CVD-chemical-vapor-deposition.--768x473.jpg 768w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Explanation-of-the-principles-of-CVD-chemical-vapor-deposition.--1536x945.jpg 1536w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Explanation-of-the-principles-of-CVD-chemical-vapor-deposition.-.jpg 2000w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<p><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>&#8216;CVD (chemical vapor deposition)&#8217;.<\/strong><\/h2>\n\n\n\n<p>There are several types of thin film formation, as shown in the diagram below.<\/p>\n\n\n\n<figure class=\"wp-block-table is-style-regular\"><table class=\"\"><thead><tr><th><br>How to make thin films<\/th><th>Details<\/th><\/tr><\/thead><tbody><tr><td><br>evaporation method<br><\/td><td>This technique forms thin films by evaporating deposition materials such as metals and oxides in a vacuumed container and depositing them on the surfaces of opposing substrates.<br>References\u203b1.2.3.4<\/td><\/tr><tr><td><br>Ion plating (IP) method<\/td><td><br>In principle, it is almost identical to the evaporation method, but the evaporation material is ionized by passing the evaporation particles through a plasma.<br>A negative voltage is applied to the substrate to be deposited and the ionized deposition material is accelerated to impact the substrate to form a thin film.<br>Ionization and acceleration can create highly adherent films.<br><br>References\u203b1.5<\/td><\/tr><tr><td><br>sputtering method<br><br><\/td><td>Ions (usually Ar+ ions) created in the plasma by the discharge strike a plate (target) of the deposition material, which splashes the material.<br><br>This is a method whereby the flung deposition material flies to the substrate to form a thin film.<br><br>The sputtering method can be used for a wide range of deposition materials, such as metals and alloys with high melting points, which are difficult to deposit using the vapor deposition method.<br><br>References\u203b1.5.6<\/td><\/tr><tr><td>Chemical vapor deposition (CVD) method<\/td><td>A method whereby gases containing the elements to be deposited are pumped onto the surface of a substrate and the films are deposited through chemical reactions and decomposition.<br><br>There are different types of CVD, including thermal CVD, where the substrate is heated, and plasma CVD, where the reaction tube is depressurized and plasma is generated.<br><br>References\u203b1.7.8<\/td><\/tr><tr><td><br>Atomic layer deposition (ALD) method<\/td><td><br>Atomic layer deposition (ALD) is also called a type of CVD, in which two or more types of raw material gases (precursor) are alternately introduced and exhausted to form a film by reacting the molecules of the raw materials that are adsorbed on the deposition surface.<br><br>references\u203b8.9<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n<style type=\"text\/css\"><!--\ntable tr td:first-of-type {width: 30%;}\n--><\/style>\n\n\n\n<div class=\"wp-block-group\"><div class=\"wp-block-group__inner-container is-layout-flow wp-block-group-is-layout-flow\">\n<p class=\"has-small-font-size\">References\uff1a<\/p>\n\n\n\n<p class=\"has-small-font-size\">\u203b1 \u66f8\u7c4d\u300c\u4eca\u65e5\u304b\u3089\u30e2\u30ce\u77e5\u308a\u30b7\u30ea\u30fc\u30ba \u30c8\u30b3\u30c8\u30f3\u3084\u3055\u3057\u3044\u771f\u7a7a\u306e\u672c\u300d p92-p93<br>\u203b2 <a aria-label=\"undefined (opens in a new tab)\" href=\"https:\/\/www.oike-kogyo.co.jp\/research\/column\/vacuum_dep\/\" target=\"_blank\" rel=\"noreferrer noopener\">\u5c3e\u6c60\u5de5\u696d\u682a\u5f0f\u4f1a\u793e<\/a><br>\u203b3<a aria-label=\"undefined (opens in a new tab)\" href=\"https:\/\/kotobank.jp\/word\/\u84b8\u7740\u6cd5-161215#:~:text=\u84b8\u7740\u6cd5\u3058\u3087\u3046\u3061\u3083\u304f,\u91cd\u8981\u306a\u65b9\u6cd5\u3067\u3042\u308b%E3%80%82\" target=\"_blank\" rel=\"noreferrer noopener\">\u30b3\u30c8\u30d0\u30f3\u30af<\/a><br>\u203b4<a aria-label=\"undefined (opens in a new tab)\" href=\"https:\/\/ja.wikipedia.org\/wiki\/\u84b8\u7740\" target=\"_blank\" rel=\"noreferrer noopener\">\u30a6\u30a3\u30ad\u30da\u30c7\u30a3\u30a2<\/a><br>\u203b5<a aria-label=\"undefined (opens in a new tab)\" href=\"http:\/\/www.tohokaken.jp\/index.htm\" target=\"_blank\" rel=\"noreferrer noopener\">\u6771\u90a6\u5316\u7814\u682a\u5f0f\u4f1a\u793e<\/a><br>\u203b6<a aria-label=\"undefined (opens in a new tab)\" href=\"https:\/\/www.oike-kogyo.co.jp\/research\/column\/sputtering\/\" target=\"_blank\" rel=\"noreferrer noopener\">\u5c3e\u6c60\u5de5\u696d\u682a\u5f0f\u4f1a\u793e<\/a><br>\u203b7<a href=\"https:\/\/ja.wikipedia.org\/wiki\/\u5316\u5b66\u6c17\u76f8\u6210\u9577\">\u30a6\u30a3\u30ad\u30da\u30c7\u30a3\u30a2<\/a><br>\u203b8<a aria-label=\"undefined (opens in a new tab)\" href=\"https:\/\/www.jstage.jst.go.jp\/article\/jvsj2\/59\/7\/59_16-LC-011\/_pdf\/-char\/ja\" target=\"_blank\" rel=\"noreferrer noopener\">\u5316\u5b66\u7684\u6c17\u76f8\u6210\u9577\u6cd5\u306e\u57fa\u672c\u3000\u8ad6\u6587<\/a><br>\u203b9<a aria-label=\"undefined (opens in a new tab)\" href=\"https:\/\/ja.wikipedia.org\/wiki\/\u539f\u5b50\u5c64\u5806\u7a4d#:~:text=\u539f\u5b50\u5c64\u5806\u7a4d\u3001\u307e\u305f\u306f\u539f\u5b50,1\u5206\u985e\u3068\u3055\u308c\u308b%E3%80%82\" target=\"_blank\" rel=\"noreferrer noopener\">\u30a6\u30a3\u30ad\u30da\u30c7\u30a3\u30a2<\/a><\/p>\n<\/div><\/div>\n\n\n\n<p>Explanation of chemical vapor deposition (CVD).<\/p>\n\n\n\n<p>In CVD, the raw materials for the thin film are supplied to the deposition chamber in the form of gas, which is decomposed by heat or plasma energy to form a metallic or compound thin film that is deposited on the surface of the substrate material.<\/p>\n\n\n\n<p>No other thin film fabrication technology is as versatile as CVD.<\/p>\n\n\n\n<p>It\u2019s used in a wide range of applications, such as electronic devices, decorative coatings, hard coatings and film coatings.<\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">Principles of CVD<\/h2>\n\n\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Principles-of-CVD.jpg\" alt=\"\" class=\"wp-image-3765\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Principles-of-CVD.jpg 1024w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Principles-of-CVD-300x225.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/01\/Principles-of-CVD-768x576.jpg 768w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<p>The principle of CVD is explained in more detail with reference to the diagram above.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>Raw material gas supply<\/li><li>Transport of raw material gases to the surface of the substrate.<\/li><li>Diffusion and decomposition of raw material gases at the substrate surface.<\/li><li>Nucleation and evaporation of volatile reaction products<\/li><li>Removal of reaction products<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p>The key factors determining film quality in CVD methods are the following.<\/p>\n\n\n\n<ul class=\"wp-block-list\"><li>What raw gas combination to use?<\/li><li>How much flow rate of gas would be applicable?<\/li><li>How much pressure to use?<\/li><li>How much energy does it take to decompose the raw material gas and grow thin films?<\/li><\/ul>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">Introduction of three types of CVD methods.<\/h2>\n\n\n\n<p>CVD is classified according to the method of decomposition of the raw material gas as follows.<br><\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">1.thermal CVD&nbsp;<\/h3>\n\n\n\n<p>Thermal CVD involves the heat to decompose the raw material gases.<br>The temperature of the substrate is the temperature required for the dissociation of the raw material gas.<\/p>\n\n\n\n<p>Fairly high temperatures of 500-700\u00b0C when depositing metal thin films and 700-1000\u00b0C when depositing metal nitride and carbide thin films.<\/p>\n\n\n\n<p>Therefore, if the substrate is not heat resistant, the thermal CVD cannot be used.<\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">2.plasma CVD&nbsp;<\/h3>\n\n\n\n<p>Plasma CVD uses plasma to decompose the raw material gas. Substrate temperatures can be lower than it\u2019s required for thermal CVD.<\/p>\n\n\n\n<p>It is not practical for substrates with large areas due to the difficulty in obtaining uniform film pressure and quality.<\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 class=\"wp-block-heading\">3.MOCVD<\/h3>\n\n\n\n<p>MOCVD is a special CVD method that uses organometallic compounds as the raw material gas.<br>Organometallic compounds are compounds formed by the association of metals with hydrocarbon groups.<\/p>\n\n\n\n<p>Devices fabricated by MOCVD are used in a surprisingly large number of applications.<\/p>\n\n\n\n<p>Infrared light-emitting diodes are used as light sources for household appliance remote controls, while light-emitting diodes for blue light are used for traffic signals.<\/p>\n\n\n\n<p>It\u2019s also heavily used in the process of creating semiconductor lasers, and laser diodes are used to read signals on CDs and DVDs.<\/p>\n\n\n\n<p>Furthermore, listening to music and watching DVDs are also possible thanks to this technology.<\/p>\n\n\n\n<div style=\"height:20px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\">Summary<\/h2>\n\n\n\n<p>When forming thin films, different methods and equipment are used, depending on the application and material.<\/p>\n\n\n\n<p>In this article, the CVD (chemical vapor deposition) method, a thin film formation process, was explained.<\/p>\n\n\n\n<p>We manufacture and supply R&amp;D equipment, which is indispensable for deposition.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?cat=4\">Click here to find out more product.<\/a><\/p>\n\n\n","protected":false},"excerpt":{"rendered":"<p>&#8216;CVD (chemical vapor deposition)&#8217;. There are several types of t[\u3082\u3063\u3068\u8aad\u307e\u305b\u3066\u301c]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[44,48],"tags":[],"class_list":["post-3762","post","type-post","status-publish","format-standard","hentry","category-topics","category-vacuum-equipment"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.2 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Explanation of the principles of CVD (chemical vapor deposition). | SUGA Co., Ltd.<\/title>\n<meta name=\"description\" content=\"&#039;CVD (chemical vapor deposition)&#039;. 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