{"id":3993,"date":"2024-06-07T14:05:55","date_gmt":"2024-06-07T05:05:55","guid":{"rendered":"https:\/\/agus.co.jp\/en\/?p=3993"},"modified":"2024-06-07T14:31:47","modified_gmt":"2024-06-07T05:31:47","slug":"a-simple-introduction-to-the-principles-of-magnetron-sputtering","status":"publish","type":"post","link":"https:\/\/agus.co.jp\/en\/?p=3993","title":{"rendered":"A simple introduction to the principles of magnetron sputtering."},"content":{"rendered":"\n<p><\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"578\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_6800016_M-1024x578.jpg\" alt=\"\" class=\"wp-image-3997\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_6800016_M-1024x578.jpg 1024w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_6800016_M-300x169.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_6800016_M-768x433.jpg 768w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_6800016_M-1536x867.jpg 1536w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_6800016_M.jpg 1600w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<p>There are many methods of sputtering, of which &#8216;magnetron sputtering&#8217; is introduced today.<\/p>\n\n\n\n<p>The principles of magnetron sputtering, easy-to-understand illustrations, and the advantages and disadvantages during deposition are also explained.<\/p>\n\n\n\n<div style=\"height:16px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Principle of magnetron sputtering<\/strong><\/h2>\n\n\n\n<p>Magnetron sputtering was developed to improve the slow deposition rate of bipolar sputtering.<\/p>\n\n\n\n<p>By enclosing electrons in a magnetic field using magnets, a dense plasma region is created, increasing the probability of argon atoms striking the target and thus increasing the speed at which they adhere to the substrate.<\/p>\n\n\n\n<p>Magnetron sputtering is now the standard method.<\/p>\n\n\n\n<div style=\"height:16px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Advantages and disadvantages of magnetron sputtering<\/strong><\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"683\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_70029402_M-1024x683.jpg\" alt=\"Advantages and disadvantages of magnetron sputtering\" class=\"wp-image-3994\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_70029402_M-1024x683.jpg 1024w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_70029402_M-300x200.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_70029402_M-768x512.jpg 768w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_70029402_M-1536x1024.jpg 1536w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/pixta_70029402_M.jpg 1600w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>Advantages<\/strong><\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>The substrate is less damaged by the heat and ions of the plasma.<\/li>\n\n\n\n<li>Fast and efficient deposition of films<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\"><strong>Disadvantages<\/strong><\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>The magnetic field is not uniform, so that plasma with a higher concentration is generated in areas with a higher magnetic flux density, the lower the location of magnetic flux density, the lower the concentration of the plasma.<\/li>\n\n\n\n<li>In the case of magnets, the magnetic flux density is generally lower in the center of the S and N poles, so the plasma is thinner in the center.<\/li>\n\n\n\n<li>The amount of target removal is likely to be uneven (also called erosion).<\/li>\n<\/ul>\n\n\n\n<div style=\"height:16px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Illustration of magnetron spattering.<\/strong><\/h2>\n\n\n\n<figure class=\"wp-block-image size-large\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"655\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/\u4fee\u6b63\u7248_\u30de\u30b0\u30cd\u30c8\u30ed\u30f3\u30b9\u30d1\u30c3\u30bf\u306e\u30a4\u30e9\u30b9\u30c8\u56f3\u89e3-1024x655.jpg\" alt=\"\" class=\"wp-image-3995\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/\u4fee\u6b63\u7248_\u30de\u30b0\u30cd\u30c8\u30ed\u30f3\u30b9\u30d1\u30c3\u30bf\u306e\u30a4\u30e9\u30b9\u30c8\u56f3\u89e3-1024x655.jpg 1024w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/\u4fee\u6b63\u7248_\u30de\u30b0\u30cd\u30c8\u30ed\u30f3\u30b9\u30d1\u30c3\u30bf\u306e\u30a4\u30e9\u30b9\u30c8\u56f3\u89e3-300x192.jpg 300w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/\u4fee\u6b63\u7248_\u30de\u30b0\u30cd\u30c8\u30ed\u30f3\u30b9\u30d1\u30c3\u30bf\u306e\u30a4\u30e9\u30b9\u30c8\u56f3\u89e3-768x492.jpg 768w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/\u4fee\u6b63\u7248_\u30de\u30b0\u30cd\u30c8\u30ed\u30f3\u30b9\u30d1\u30c3\u30bf\u306e\u30a4\u30e9\u30b9\u30c8\u56f3\u89e3.jpg 1200w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<p><\/p>\n\n\n\n<p>A permanent magnet is placed below the target and the magnetic field generates a high-density plasma, which is deposited by atoms bounced off the target by sputtering.<\/p>\n\n\n\n<div style=\"height:16px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Introduction of magnetron sputtering equipment of SUGA<\/strong><\/h2>\n\n\n\n<p>SSP3000<\/p>\n\n\n\n<p>High-end model of sputtering equipment with high performance and a variety of options<\/p>\n\n\n\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"320\" height=\"370\" src=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/image7-3.png\" alt=\"High-end model of sputtering equipment with high performance and a variety of options\" class=\"wp-image-3996\" srcset=\"https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/image7-3.png 320w, https:\/\/agus.co.jp\/en\/wp-content\/uploads\/2024\/06\/image7-3-259x300.png 259w\" sizes=\"auto, (max-width: 320px) 100vw, 320px\" \/><\/figure>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?cat=4\">Other products<\/a><\/p>\n\n\n\n<div style=\"height:16px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h2 class=\"wp-block-heading\"><strong>Summary<\/strong><\/h2>\n\n\n\n<p>This article explains the principles and features of magnetron sputtering in detail.<\/p>\n\n\n\n<p>In addition to sputtering equipment, we also manufacture other vacuum equipment such as ALD and evaporation equipment.<\/p>\n\n\n\n<p><a href=\"https:\/\/agus.co.jp\/en\/?cat=4\">If you are interested, please click here for a list of products.<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>A simple introduction to the principles of magnetron sputtering.<\/p>\n","protected":false},"author":1,"featured_media":3997,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[50],"tags":[],"class_list":["post-3993","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-sputtering"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>A simple introduction to the principles of 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