{"id":4106,"date":"2024-08-19T11:05:33","date_gmt":"2024-08-19T02:05:33","guid":{"rendered":"https:\/\/agus.co.jp\/en\/?p=4106"},"modified":"2024-08-19T12:45:10","modified_gmt":"2024-08-19T03:45:10","slug":"the-complete-version-overview-and-applications-of-eight-types-of-vacuum-equipment-recommended-for-research-and-development","status":"publish","type":"post","link":"https:\/\/agus.co.jp\/en\/?p=4106","title":{"rendered":"The complete version. Overview and applications of eight types of vacuum equipment recommended for research and development ."},"content":{"rendered":"\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

Vacuum equipment refers to devices that utilize vacuum conditions, and vacuum systems are set up and operated according to the purpose.<\/p>\n\n\n\n

It is an indispensable piece of equipment in recent industrial developments and in various applications and research.<\/p>\n\n\n\n

Therefore, this issue introduces eight types of vacuum equipment and a total of 17 machines from AGUS, which deals with vacuum equipment.<\/p>\n\n\n\n

This is a useful reference for research institutes and those considering it in the development of new materials.<\/p>\n\n\n\n

<\/p>\n\n\n\n

<\/div>\n\n\n\n

Photoemission electron microscopy (PEEM) for real-time 2D mapping of sample surfaces.<\/strong><\/h2>\n\n\n\n

Photoemission electron microscopy is an electron microscope that detects photoelectrons emitted from a sample by exposing it to short wavelengths of light, such as ultraviolet light.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

The main application is to track the dynamic processes of thin film growth and catalytic reactions.<\/p>\n\n\n\n

It can also be applied to gas adsorption and spin observation using circularly polarized UV light.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

MyPEEM<\/p>\n\n\n\n

Japan’s only general-purpose photoemission electron microscope.<\/p>\n\n\n\n

To compensate for aberrations caused by the lens and assembly, the system is equipped with a two-stage electrostatic compensator developed in-house.<\/p>\n\n\n\n

More information on MyPEEM.<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Sputtering equipment for deposition systems using the sputtering phenomenon.<\/strong><\/h2>\n\n\n\n

Sputtering equipment is a PVD thin film forming system that uses the ‘sputtering phenomenon’, in which Ar gas ionised under a plasma discharge collides with a target at high speed, and the target atoms knocked out by the collision adhere to the opposing substrate.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

It can be available in research and development such as a metal film, the insulation film, a transmission film, the insulation film, a protective film, a reflection film, a catalyst, coating, a circuit, a battery, MEMS, the new materials development.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SSP1000 Cubic Sputtering Equipment<\/strong><\/p>\n\n\n\n

Entry-level model for desk top RF sputtering.<\/p>\n\n\n\n

Even the table-top model has a performance of less than \u00b15% \u03a6100 mm film thickness distribution and uses the same cathode structure as the higher-end models.<\/p>\n\n\n\n

The system can be adapted to the installation environment by changing the deposition direction and selecting the placement method.<\/p>\n\n\n\n

More information on SSP1000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
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<\/p>\n\n\n\n

SSP2000Plus\u3000Expandable Sputtering Equipment<\/strong><\/p>\n\n\n\n

A middle model that is easy to use for experiments, this slim tower of 2D cathodes can be combined with ALD and annealing equipment.<\/p>\n\n\n\n

When connected to the STR2000, it has the function of a load lock chamber.<\/p>\n\n\n\n

More information on SSP2000Plus<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
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<\/p>\n\n\n\n

SSP2500G\u3000Sputtering Equipment with Glove box<\/strong><\/p>\n\n\n\n

Equipped with a simple vacuum-replaceable glove box (made of acrylic resin), which allows substrate replacement and target removal and attachment without exposure to atmospheric moisture or oxygen.<\/p>\n\n\n\n

Targets and wafers can be opened in GB.<\/p>\n\n\n\n

More information on SSP2500G<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SSP3000\u3000High-end model Sputtering Equipment<\/strong><\/p>\n\n\n\n

This is a multifunctional, three-dimensional cathode, high-performance model of sputtering equipment.<\/p>\n\n\n\n

The design of the touch panel, which takes visibility and operability into consideration, and the design of the deposition chamber, which combines the main unit with the exhaust system and the electrical control system mount into a single unit, enhance the appearance and functionality.<\/p>\n\n\n\n

More information on SSP3000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SSP3000Plus\u3000High-performance model expandable Sputtering Equipment.<\/strong><\/p>\n\n\n\n

Advanced thin-film manufacturing processes are possible, such as stacking with ALD equipment, which is achieved by linking with Plus series equipment, and combining with annealing equipment for heat treatment and gas displacement treatment.<\/p>\n\n\n\n

Expandability<\/p>\n\n\n\n

\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

More information on SSP3000pPlus<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

<\/p>\n\n\n\n

ALD system capable of depositing films with high film quality and high step coverage.<\/strong><\/h2>\n\n\n\n

<\/p>\n\n\n\n

ALD systems are compact atomic layer deposition systems for research and development (ALD = Atomic Layer Deposition) that enable precise and uniform control of each atomic layer and the deposition of films with high film quality and step coverage even on uneven surfaces.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

Oxide films (AL2O3, HfO2, SiO2, TiO2) can be deposited by surface chemical reactions with water or ozone using raw materials in precursor bottles, as deposition material.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SAL1000 Desktop-type ALD<\/strong><\/p>\n\n\n\n

This entry-level model of ALD equipment can easily produce thin films one atomic layer at a time.<\/p>\n\n\n\n

Simple, easy operation and a portable design make it easy to move around the table-top model.<\/p>\n\n\n\n

More information on SAL1000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

SAL1000B\u3000Powder ALD<\/strong><\/p>\n\n\n\n

SAL1000B is an ALD system that enables all-round deposition on powder.<\/p>\n\n\n\n

The main feature of the machine is that it can deposit films on powder by tilting + rotating + vibrating.<\/p>\n\n\n\n

The ability to deposit an all-round film on powder enables it to play an active role in the development of new materials, for example.<\/p>\n\n\n\n

More information on SAL1000B<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SAL1000G\u3000ALD with Glove Box<\/strong><\/p>\n\n\n\n

A desk top ALD system that combines functionality and performance, capable of depositing films on wafers or powders.<\/p>\n\n\n\n

Equipped with a glove box, this model meets the deposition needs of anaerobic materials that react with oxidation and the atmosphere.<\/p>\n\n\n\n

More information on SAL1000G<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

SAL3000\u3000Compact ALD system with full functions.<\/strong><\/p>\n\n\n\n

The SAL3000 model is 40% smaller in width than the previous standard model.<\/p>\n\n\n\n

In addition to the conventional depot-down type specification, a ‘depot-up’ type is available to further reduce particle adhesion to the substrate.<\/p>\n\n\n\n

More information on SAL3000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

Expandable ALD<\/strong><\/p>\n\n\n\n

A product that has succeeded in significantly downsizing the main unit while maintaining the deposition performance of the SAL3000.<\/p>\n\n\n\n

Furthermore, it is a high-performance ALD system that can be combined with other equipment to support a wide range of deposition processes.<\/p>\n\n\n\n

More information on SAL3000Plus<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Evaporation equipment for depositing films on substrates by evaporating metallic materials installed in a heat source.<\/h2>\n\n\n\n

Deposition equipment heats deposition materials such as metals and metal oxides in a vacuum and forms thin films by attaching and depositing evaporated atoms on the surface of a substrate or board.<\/p>\n\n\n\n

<\/div>\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

Suitable for research and development where film thickness can be controlled with a quartz crystal film thickness gauge and is intended for the deposition of metal or oxide films on substrates.<\/p>\n\n\n\n

<\/div>\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SEV2000Plus \u3000Compact evaporation systems for R&D<\/strong><\/p>\n\n\n\n

The SEV2000Plus allows automatic exhaust operation from a touch screen and has various interlocks to prevent malfunctions.<\/p>\n\n\n\n

It features a small, footprint-saving design and the possibility of expansion with Plus series equipment.<\/p>\n\n\n\n

More information on SEV2000Plus<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Annealing equipment for high temperature heat treatment to substrates.<\/strong><\/h2>\n\n\n\n

Annealing equipment is equipment capable of performing high-temperature heat treatment and gas replacement on substrates.<\/p>\n\n\n\n

Pressure can also be controlled during heat treatment by introducing inert gas.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

The film can be modified by heating the wafer at high temperatures in a vacuum.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SAN1000\u3000Desktop Annealing\u30fbNitriding Treatment Equipment<\/p>\n\n\n\n

The SAN1000 can make a heat treatment for  substrates up to 4 inches by infrared irradiation in a clean environment in a vacuum or gas atmosphere.<\/p>\n\n\n\n

Furthermore, a cooling mechanism allows substrates to be removed from the machine after processing in a short time.<\/p>\n\n\n\n

More information on SAN1000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SAN2000Plus  Annealing system capable of plasma treatment.<\/strong><\/p>\n\n\n\n

As with SAN1000, heat treatment can be carried out in a clean environment.<\/p>\n\n\n\n

In addition, it combines plasma process technology capable of removing organic and metallic films from the substrate surface and surface modification, and is rich in functionality, performing both pre- and post-process processing for substrate deposition.<\/p>\n\n\n\n

More information on SAN2000Plus<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Transfer unit to transport wafers to the equipment under vacuum.<\/strong><\/h2>\n\n\n\n

This is the substrate transfer unit for complex equipment that can be freely combined with up to three major types of equipment, such as ALD equipment, sputtering equipment and annealing equipment.<\/p>\n\n\n\n

<\/div>\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

It plays the role of a core device responsible for the transfer of substrates in the equipment verb and can also be used as a load lock chamber.<\/p>\n\n\n\n

The combined system also allows substrates to be passed to the process chambers of the respective equipment without exposing them to the atmosphere.<\/p>\n\n\n\n

<\/div>\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

STR2000\u3000Transfer Unit<\/strong><\/p>\n\n\n\n

The structure incorporates a frog-leg transfer (substrate transfer mechanism) and rectangular gate valve in the core chamber, providing high quality, performance, reliability, safety and low cost.<\/p>\n\n\n\n

More information on STR2000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n

Heating furnaces with higher precision temperature control.<\/strong><\/h2>\n\n\n\n

Heating furnaces heat objects to a predetermined temperature and are used for multiple purposes, such as rolling, forging and melting.<\/p>\n\n\n\n

It is mainly used to increase the extensibility, ductility, etc. of metals. In addition to pressure control, gas and<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

Atmosphere furnaces equipped with an annular furnace to heat quartz or ceramic core tubes.<\/p>\n\n\n\n

Atmosphere control systems can be selected and constructed to suit R&D use.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

<\/p>\n\n\n\n

SAF3000 Atmosphere Controlled Furnace<\/strong><\/p>\n\n\n\n

The SAF3000 is a tubular heating furnace with thermocouples mounted inside the core tube.<\/p>\n\n\n\n

An automatic furnace body sliding mechanism enables rapid heating and cooling by moving the furnace body.<\/p>\n\n\n\n

In addition to batch steam introduction and continuous steam introduction using a distillation machine, steam traps can be used to adjust the steam volume.<\/p>\n\n\n\n

More information on SAF3000<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Space chambers for space environment testing, etc<\/strong><\/h2>\n\n\n\n

Space chambers can be used to evaluate the space environmental resistance of components and materials for satellites and space shuttles.<\/p>\n\n\n\n

Miniaturization will make them widely used in aerospace industry related fields.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Uses<\/strong><\/h3>\n\n\n\n

A wide variety of experiments can be carried out, including PFM (proto-flight model) tests of hyperspectral sensors, performance evaluation of various observation instruments and environmental tests of launch vehicle onboard components.<\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

Products<\/strong><\/h3>\n\n\n\n
\"\"<\/figure>\n\n\n\n

Space Chamber -\u03a61m-<\/strong><\/p>\n\n\n\n

Easy to handle as an evaluation of small components and a full-scale device equipped with a cooling shroud.<\/p>\n\n\n\n

The abundance of introduction ports makes it versatile.<\/p>\n\n\n\n

More information on Space Chamber<\/a><\/p>\n\n\n\n

<\/div>\n\n\n\n\n\n

In summary: Leave it to us! if you are in need of vacuum equipment, <\/strong><\/h2>\n\n\n\n

In this article, we have introduced the types of vacuum equipment and products available at SUGA in Hokkaido, Japan.<\/p>\n\n\n\n

We supply annealing equipment for film quality improvement applications after film deposition as vacuum equipment, and provide vacuum piping components required for the configuration of vacuum equipment and vacuum facilities.<\/p>\n\n\n\n

We also offer support for servicing, repairs and modifications, please contact us for more information.<\/p>\n

\u00a0<\/p>\n","protected":false},"excerpt":{"rendered":"

Vacuum equipment refers to devices that utilize vacuum conditions, and vacu[\u3082\u3063\u3068\u8aad\u307e\u305b\u3066\u301c]<\/p>\n","protected":false},"author":1,"featured_media":4132,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[58],"tags":[],"class_list":["post-4106","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-technology"],"acf":[],"yoast_head":"\nThe complete version. 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