SAL3000
Deposition direction, glove box and LL chamber can be selected.
製品一覧
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SAL3000Plus
Expandable Model. Deposition direction selectable.
Substrate Heating up to 800℃
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MMC-Electromagnetic Clutch
It is used for the counter and the pump unit and transmit the engine rotation power to the pump.
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Air Clutch
It is mainly used for the spindle front drive and transmit the engine rotation power to the generator.
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SAN1000
Pressure control during heat treatment (annealing) to the substrate and heat treatment by introducing inert gas is possible.
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SAN2000Plus
The temperature control of Max.1000deg.C is achievable and RF power source can be equipped with and the combination with other systems can be possible.
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SEV2000Plus
This is a vacuum evaporation system for the deposition of metal films and oxide films.
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STR2000
This is the space-saving automated substrate transfer arm which can connect with 3 plus series.
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SAF3000
Precise temperature control, pressure control, water vapor introduction and rapid cooling are possible.
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Space Chamber -Φ1m-
Various introduction ports.