SAN1000
Pressure control during heat treatment (annealing) to the substrate and heat treatment by introducing inert gas is possible.
製品一覧
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SAN2000Plus
The temperature control of Max.1000deg.C is achievable and RF power source can be equipped with and the combination with other systems can be possible.
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SEV2000Plus
This is a vacuum evaporation system for the deposition of metal films and oxide films.
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STR2000
This is the space-saving automated substrate transfer arm which can connect with 3 plus series.
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SAF3000
Precise temperature control, pressure control, water vapor introduction and rapid cooling are possible.
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Space Chamber -Φ1m-
Various introduction ports.
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SWE1000
Chemicals, H2O and Nitrogen are introduced by the spray.
Recipes can be created.
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Electromagnetic Rotary Pump Valve
This valve corresponds to in-house produced isolation valves; NW25 and NW40.
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Vacuum Chamber
It can be fabricated in either stainless steel or aluminum.
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JIS Vacuum Flange
VG/VF as vacuum flange (JIS Standard) are available as our in-house products.