ALD Equipment

  • SAL3000Plus

    Expandable Model. Deposition direction selectable.
    Substrate Heating up to 800℃

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  • SAN1000

    Pressure control during heat treatment (annealing) to the substrate and heat treatment by introducing inert gas is possible.

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  • SAN2000Plus

    The temperature control of Max.1000deg.C is achievable and RF power source can be equipped with and the combination with other systems can be possible.

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  • SEV2000Plus

    This is a vacuum evaporation system for the deposition of metal films and oxide films.

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  • STR2000

    This is the space-saving automated substrate transfer arm which can connect with 3 plus series.

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  • SAF3000

    Precise temperature control, pressure control, water vapor introduction and rapid cooling are possible.

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  • Space Chamber -Φ1m-

    Various introduction ports.

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  • SWE1000

    Chemicals, H2O and Nitrogen are introduced by the spray.
    Recipes can be created.

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  • Electromagnetic Rotary Pump Valve

    This valve corresponds to in-house produced isolation valves; NW25 and NW40.

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  • Vacuum Chamber

    It can be fabricated in either stainless steel or aluminum.

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