Vacuum equipment refers to devices that utilize vacuum conditions, and vacuum systems are set up and operated according to the purpose.
It is an indispensable piece of equipment in recent industrial developments and in various applications and research.
Therefore, this issue introduces eight types of vacuum equipment and a total of 17 machines from AGUS, which deals with vacuum equipment.
This is a useful reference for research institutes and those considering it in the development of new materials.
Contents
- 1 Photoemission electron microscopy (PEEM) for real-time 2D mapping of sample surfaces.
- 2 Sputtering equipment for deposition systems using the sputtering phenomenon.
- 3 ALD system capable of depositing films with high film quality and high step coverage.
- 4 Evaporation equipment for depositing films on substrates by evaporating metallic materials installed in a heat source.
- 5 Annealing equipment for high temperature heat treatment to substrates.
- 6 Transfer unit to transport wafers to the equipment under vacuum.
- 7 Heating furnaces with higher precision temperature control.
- 8 Space chambers for space environment testing, etc
- 9 In summary: Leave it to us! if you are in need of vacuum equipment,
Photoemission electron microscopy (PEEM) for real-time 2D mapping of sample surfaces.
Photoemission electron microscopy is an electron microscope that detects photoelectrons emitted from a sample by exposing it to short wavelengths of light, such as ultraviolet light.
Uses
The main application is to track the dynamic processes of thin film growth and catalytic reactions.
It can also be applied to gas adsorption and spin observation using circularly polarized UV light.
Products
MyPEEM
Japan’s only general-purpose photoemission electron microscope.
To compensate for aberrations caused by the lens and assembly, the system is equipped with a two-stage electrostatic compensator developed in-house.
Sputtering equipment for deposition systems using the sputtering phenomenon.
Sputtering equipment is a PVD thin film forming system that uses the ‘sputtering phenomenon’, in which Ar gas ionised under a plasma discharge collides with a target at high speed, and the target atoms knocked out by the collision adhere to the opposing substrate.
Uses
It can be available in research and development such as a metal film, the insulation film, a transmission film, the insulation film, a protective film, a reflection film, a catalyst, coating, a circuit, a battery, MEMS, the new materials development.
Products
SSP1000 Cubic Sputtering Equipment
Entry-level model for desk top RF sputtering.
Even the table-top model has a performance of less than ±5% Φ100 mm film thickness distribution and uses the same cathode structure as the higher-end models.
The system can be adapted to the installation environment by changing the deposition direction and selecting the placement method.
SSP2000Plus Expandable Sputtering Equipment
A middle model that is easy to use for experiments, this slim tower of 2D cathodes can be combined with ALD and annealing equipment.
When connected to the STR2000, it has the function of a load lock chamber.
More information on SSP2000Plus
SSP2500G Sputtering Equipment with Glove box
Equipped with a simple vacuum-replaceable glove box (made of acrylic resin), which allows substrate replacement and target removal and attachment without exposure to atmospheric moisture or oxygen.
Targets and wafers can be opened in GB.
SSP3000 High-end model Sputtering Equipment
This is a multifunctional, three-dimensional cathode, high-performance model of sputtering equipment.
The design of the touch panel, which takes visibility and operability into consideration, and the design of the deposition chamber, which combines the main unit with the exhaust system and the electrical control system mount into a single unit, enhance the appearance and functionality.
SSP3000Plus High-performance model expandable Sputtering Equipment.
Advanced thin-film manufacturing processes are possible, such as stacking with ALD equipment, which is achieved by linking with Plus series equipment, and combining with annealing equipment for heat treatment and gas displacement treatment.
Expandability
More information on SSP3000pPlus
ALD system capable of depositing films with high film quality and high step coverage.
ALD systems are compact atomic layer deposition systems for research and development (ALD = Atomic Layer Deposition) that enable precise and uniform control of each atomic layer and the deposition of films with high film quality and step coverage even on uneven surfaces.
Uses
Oxide films (AL2O3, HfO2, SiO2, TiO2) can be deposited by surface chemical reactions with water or ozone using raw materials in precursor bottles, as deposition material.
Products
SAL1000 Desktop-type ALD
This entry-level model of ALD equipment can easily produce thin films one atomic layer at a time.
Simple, easy operation and a portable design make it easy to move around the table-top model.
SAL1000B Powder ALD
SAL1000B is an ALD system that enables all-round deposition on powder.
The main feature of the machine is that it can deposit films on powder by tilting + rotating + vibrating.
The ability to deposit an all-round film on powder enables it to play an active role in the development of new materials, for example.
SAL1000G ALD with Glove Box
A desk top ALD system that combines functionality and performance, capable of depositing films on wafers or powders.
Equipped with a glove box, this model meets the deposition needs of anaerobic materials that react with oxidation and the atmosphere.
SAL3000 Compact ALD system with full functions.
The SAL3000 model is 40% smaller in width than the previous standard model.
In addition to the conventional depot-down type specification, a ‘depot-up’ type is available to further reduce particle adhesion to the substrate.
Expandable ALD
A product that has succeeded in significantly downsizing the main unit while maintaining the deposition performance of the SAL3000.
Furthermore, it is a high-performance ALD system that can be combined with other equipment to support a wide range of deposition processes.
More information on SAL3000Plus
Evaporation equipment for depositing films on substrates by evaporating metallic materials installed in a heat source.
Deposition equipment heats deposition materials such as metals and metal oxides in a vacuum and forms thin films by attaching and depositing evaporated atoms on the surface of a substrate or board.
Uses
Suitable for research and development where film thickness can be controlled with a quartz crystal film thickness gauge and is intended for the deposition of metal or oxide films on substrates.
Products
SEV2000Plus Compact evaporation systems for R&D
The SEV2000Plus allows automatic exhaust operation from a touch screen and has various interlocks to prevent malfunctions.
It features a small, footprint-saving design and the possibility of expansion with Plus series equipment.
More information on SEV2000Plus
Annealing equipment for high temperature heat treatment to substrates.
Annealing equipment is equipment capable of performing high-temperature heat treatment and gas replacement on substrates.
Pressure can also be controlled during heat treatment by introducing inert gas.
Uses
The film can be modified by heating the wafer at high temperatures in a vacuum.
Products
SAN1000 Desktop Annealing・Nitriding Treatment Equipment
The SAN1000 can make a heat treatment for substrates up to 4 inches by infrared irradiation in a clean environment in a vacuum or gas atmosphere.
Furthermore, a cooling mechanism allows substrates to be removed from the machine after processing in a short time.
SAN2000Plus Annealing system capable of plasma treatment.
As with SAN1000, heat treatment can be carried out in a clean environment.
In addition, it combines plasma process technology capable of removing organic and metallic films from the substrate surface and surface modification, and is rich in functionality, performing both pre- and post-process processing for substrate deposition.
More information on SAN2000Plus
Transfer unit to transport wafers to the equipment under vacuum.
This is the substrate transfer unit for complex equipment that can be freely combined with up to three major types of equipment, such as ALD equipment, sputtering equipment and annealing equipment.
Uses
It plays the role of a core device responsible for the transfer of substrates in the equipment verb and can also be used as a load lock chamber.
The combined system also allows substrates to be passed to the process chambers of the respective equipment without exposing them to the atmosphere.
Products
STR2000 Transfer Unit
The structure incorporates a frog-leg transfer (substrate transfer mechanism) and rectangular gate valve in the core chamber, providing high quality, performance, reliability, safety and low cost.
Heating furnaces with higher precision temperature control.
Heating furnaces heat objects to a predetermined temperature and are used for multiple purposes, such as rolling, forging and melting.
It is mainly used to increase the extensibility, ductility, etc. of metals. In addition to pressure control, gas and
Uses
Atmosphere furnaces equipped with an annular furnace to heat quartz or ceramic core tubes.
Atmosphere control systems can be selected and constructed to suit R&D use.
Products
SAF3000 Atmosphere Controlled Furnace
The SAF3000 is a tubular heating furnace with thermocouples mounted inside the core tube.
An automatic furnace body sliding mechanism enables rapid heating and cooling by moving the furnace body.
In addition to batch steam introduction and continuous steam introduction using a distillation machine, steam traps can be used to adjust the steam volume.
Space chambers for space environment testing, etc
Space chambers can be used to evaluate the space environmental resistance of components and materials for satellites and space shuttles.
Miniaturization will make them widely used in aerospace industry related fields.
Uses
A wide variety of experiments can be carried out, including PFM (proto-flight model) tests of hyperspectral sensors, performance evaluation of various observation instruments and environmental tests of launch vehicle onboard components.
Products
Space Chamber -Φ1m-
Easy to handle as an evaluation of small components and a full-scale device equipped with a cooling shroud.
The abundance of introduction ports makes it versatile.
More information on Space Chamber
In summary: Leave it to us! if you are in need of vacuum equipment,
In this article, we have introduced the types of vacuum equipment and products available at SUGA in Hokkaido, Japan.
We supply annealing equipment for film quality improvement applications after film deposition as vacuum equipment, and provide vacuum piping components required for the configuration of vacuum equipment and vacuum facilities.
We also offer support for servicing, repairs and modifications, please contact us for more information.
