SAN1000
Pressure control during heat treatment (annealing) to the substrate and heat treatment by introducing inert gas is possible.
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High-temperature heat treatment and gas replacement for substrates are possible. SAN2000Plus is capable of plasma processing.
Pressure control during heat treatment (annealing) to the substrate and heat treatment by introducing inert gas is possible.
The temperature control of Max.1000deg.C is achievable and RF power source can be equipped with and the combination with other systems can be possible.
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